China Rare Metal Material Co., Limited > Other Photographic Apparatus

Other Photographic Apparatus

Chromium metal sputtering target (Cr

China rare metal material co.,ltd supply Chromium sputtering target in very competivity price and steady quality. All our chromium sputteirng target be manufacted by HIP method. And we can sure high
cr target , sputtering target , chromium target ,

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sputtering targets(metal target, alloy

coating materials for the applications to magnetic disk and head, magneto optical disk, optical disk, superconducting thin film, protective film. Purity: 99%, 99.9%,99.95% 99.99%,99.995% 99.999% and
sputtering target , target , coating material ,

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MgF2 irragular

Magnesium Fluoride Evaporation Material Density ---3.18 g/cm3 Purity--- 99.9-99.999% or international standards type Melting point--- 1260 ¡æ Boiling point--- 2239 ¡æ,Vapour pressure at 115
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Zinc Sulphide Evaporation Material

Zinc Sulphide Evaporation Material Density--- 3.98 g/cm3 Hardness--- (acc. to Mohs) 3.5 -- 4, (acc. to Knoop) 178X27 Kg/mm2, Linear expansion coefficient 6.1X10-6 Melting point---1800¡æ,Vapour p
evaporation material , coating material , zinc sulphide ,

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Contact Information

Company:   China Rare Metal Material Co., Limited

Address:   Unit 506, ChuangYe Building,18 GaoXin 2nd Road,NanChang Hi-Tech Industry Development Zone, NanChang,

Telephone:   86-791-8101311

Website:   http://global-tradekey.com/company/G06392